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KMID : 0602720060100030016
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Implantology
2006 Volume.10 No. 3 p.16 ~ p.27
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Osseointegration Enhanced by Electron-Beam-Deposition on the Ti-implant surface
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Cho Young-Jin
Kim Seong-Kyun
Koak Jai-Young
Heo Seong-Joo
Kim Sun-Jae
Han Chong-Hyun
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Abstract
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KEYWORD
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electron beam deposition, implant, dissolution rate, hydrocyapatite
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